MTCD-5 Dark-field Multiple Targets

Micro-Tec MTC-5 Multiple Target Graticule Calibration Standards

combines calibration and imaging quality assessment in a single standard

Introduction

The new and innovative Micro-Tec MTC-5 multiple target graticule calibration standards have been designed using an ultra-flat conductive silicon substrate with corrosion resistant Chromium lines. The precise patterns are manufactured utilizing the latest semiconductor manufacturing techniques. The Micro-Tec multi target graticules provide bright and rich contrast images for ease of calibration. Intended for use with reflective light imaging,  optical quality control systems and low magnification SEM imaging for:

  • magnification calibration
  • critical dimension measurements
  • distortion correction
  • imaging quality assessment
  • quality control measurements.

There are four distinct patterns on the MTC-5 calibration standard:

  • Circle patterns from 10µm to 5mm diameter
  • Square patterns from 10x10µm to 5x5mm
  • Hexagon patterns from 10µm to 5mm across
  • Cross scale pattern of 5x5mm with 0.01mm divisions

The deposited Cr lines are in the same focus plane as the substrate, better defined and provide more signal than etched patterns. They are also less prone to accumulate dust particles in the patterns.

Each of the calibration standards has a unique product ID serial number etched on the die. The Micro-Tec MTC-5 calibration standards are NIST traceable; a wafer level certificate of tracebility is supplied with each standard. The MTC-5 is available in two versions:

  • MTC-5 with Cr lines on silicon for bright field imaging
  • MTCD-5 with inverted pattern (area between line coated with Cr) for dark field imaging

31-T33600   Micro-Tec MTC-5 Multiple target calibration standard with 4 patterns, Bright Field

AU-31-T33600 Micro-Tec MTC-5 Multiple target calibration standard with 4 patterns, Bright Field

Specifications for the Micro-Tec MTC-5 multiple target calibrating graticule standards: 

Substrate 525µm thick boron doped ultra-flat wafer with <100> orientation
Conductive Excellent; 5-10 Ohm resistivity
Patterns Circles, squares, hexagons, cross scale
Pattern size 5 x 5mm (4x)
Lines  75nm thick, pure bright Chromium lines
5µm wide lines spaced 10, 25, 50, 75, 100, 125 and 150µum apart
10µm wide lines, spaced 200, 250, 300, 350, 400, 500, 600, 700, 800 and 900µm apart
20µm wide lines spaced 1.0, 1.5, 2, 2.5, 3, 3.5, 4, 4.5 and 5mm apart
Cross scale
pattern
5mm wide lines, 5 x 5mm with 0.01mm divisions
Die size 12 x 12mm
Application Reflective light, scanning electron microscopy, optical imaging systems
Identification Product ID with serial number etched
Mounting Unmounted, mounting optionally available
Supplied Supplied in a Gel-Pak box

2 Item(s)

2 Item(s)